| Nb超导薄膜的射频磁控溅射和阳极化的研究 |
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| 引用本文： | 李元,张永明.Nb超导薄膜的射频磁控溅射和阳极化的研究[J].南京大学学报(自然科学版),1987(4). |
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| 作者姓名： | 李元 张永明 |
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| 作者单位： | 南京大学信息物理系，南京大学信息物理系 八四级研究生 |
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| 摘 要： | 本文报道了在国产JS—450A装置上,用射频磁控溅射制作高质量Nb膜的方法,所得Nb膜的Tc可达9.2K。在CS—308闭合循环制冷机上对于用这种Nb膜制成的超导微桥进行了低温测试,得到了Ic～T的变化关系和在微波辐照下的交流I—V特性。比外,本文还介绍了Nb膜阳极化研究的实验结果,以及Nb桥弱化处理方面的工作。
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| 关 键 词： | 射频磁控溅射 Nb超导膜 Nb超导微桥 Nb膜阳极化 |
DEPOSITION OF Nb FILMS BY USING RF-MAGNETRON SPUTTERING AND A STUDY OF THEIR ANODIZATION |
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| Li Yuan Zhang Yungming.DEPOSITION OF Nb FILMS BY USING RF-MAGNETRON SPUTTERING AND A STUDY OF THEIR ANODIZATION[J].Journal of Nanjing University: Nat Sci Ed,1987(4). |
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| Authors: | Li Yuan Zhang Yungming |
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| Institution: | Department of Information Physics |
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| Abstract: | This papper reports a process for fabricating high quality niobium films by using rf-magnetron spattering on machine. JS-450A, The critical temperature of the deposited film is as high as 9.2K indicating the success of the fabrication. The superconducting microbridge based on such Nb films was subjected to test at low tempertures on the CS-308 closed cycle refrigeration system and both the variation of Ic versus T and the rf induced steps on its I-V curves were successfully observed. Also described are the experimental results of the anodizerion of Nb films and its application to the weakeening of Nb microbridge. |
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| Keywords: | rf-magnetron sputtering Nb superconducting film Nb superconducting microbridge the anodizationof Nb film |
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