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集成电路光刻模拟的数据后处理研究
引用本文:贾志城,陈乖丽. 集成电路光刻模拟的数据后处理研究[J]. 甘肃联合大学学报(自然科学版), 2006, 20(3): 39-42
作者姓名:贾志城  陈乖丽
作者单位:1. 甘肃政法学院,图书馆,甘肃,兰州,730070
2. 航空航天工业部135厂,甘肃,兰州,730070
摘    要:在集成电路光刻过程中,利用光刻模拟软件将光刻模拟结果与设计模板进行比较可以预先发现模板设计中的缺陷.由于光刻模拟软件与模板设计软件数据格式的不同影响了这一步工作的顺利完成.本文通过对两种软件数据格式的研究,利用Perl语言实现了两种软件之间数据格式的转换,具有一定的实用价值.

关 键 词:光学邻近校正  光刻模拟  数据处理
文章编号:1672-691X(2006)03-0039-04
收稿时间:2005-10-20
修稿时间:2005-10-20

Study of Data-based IC Lithographic Simulation
JIA Zhi-cheng,CHENG Guai-li. Study of Data-based IC Lithographic Simulation[J]. Journal of Gansu Lianhe University :Natural Sciences, 2006, 20(3): 39-42
Authors:JIA Zhi-cheng  CHENG Guai-li
Abstract:In the process of IC Lithographic Simulation, software of Lithographic Simulation is used to compare the result of Lithographic Simulation and the design model so as to foresee the shortcoming existing in the model design. The difference of the data format between the software of Lithographic Simulation and the software of model design affects this job being carried out successfully. Through the data format study of the two kinds of software and by using Perl language to have conducted the data format transmission between the two kinds of software, the paper has certain practical value.
Keywords:Optical Proximity Correction   Lithographic Simulation   data Processing
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