金刚石薄膜的制备、表征和场发射性能

系统研究了在微波等离子体化学气相沉积(MPCVD)系统中,甲烷浓度、沉积气压、气体流量比、衬底的预处理等参数工艺对金刚石薄膜质量的影响,不同样品的扫描电镜(SEM)图片表明上述参数工艺对金刚石薄膜的微观形貌如:晶粒尺寸、均匀性、膜的连续性、致密性等具有重要影响.金刚石薄膜样品尖锐的1332cm-1Raman峰表明金刚石膜具有很高的晶化质量,与SEM图片一致.最后研究了样品的场发射特性,获得了较低的发射阈值电压4.4V/μm,电压为650V时,得到较高的约128mA/cm2的发射电流密度.

Preparation,characteristics and field emitter property of diamond films

With the microwave plasma chemical vapor deposition (MPCVD) the effects of methane concentration deposition pressure and gas flow rate on diamond coating on single crystal silicon substrate were studied systemically.The SEM pictures of different samples showed that the above mentioned parameters had very important influenced about the micro-pattern of diamond films,such as the size of crystal particle,steadiness,continuity,compactness,etc.The sharp peak 1 332cm^-1 of diamond films' Raman spectrum showed that the films had good crystallization quality,it had the same result with the SEMpicture.Finally,its properties of field emission were studied,the emission can be obtained at field as low as 4.4V/μm, and the high emission current density about 128 mA/cm² was got at 650 V.