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Character and fabrication of Al/Al2O3/Al tunnel junctions for qubit application
Authors:DanDan Shen  Ran Zhu  WeiWei Xu  JunJie Chang  ZhengMing Ji  GuoZhu Sun  ChunHai Cao  Jian Chen
Affiliation:Research Institute of Superconductor Electronics, Nanjing University, Nanjing 210093, China
Abstract:The superconductive Josephson junction is the key device for superconducting quantum computation. We have fabricated Al/Al2O3/Al tunnel junctions using a double angle evaporation method based on a suspended shadow mask. The Al2O3 junction barrier has been formed by introducing pure oxygen into the chamber during the fabrication process. We have adjusted exposure conditions by changing either the oxygen pressure or the oxidizing time during the formation of tunnel barriers to control the critical current density J c and the junction specific resistance R c . Measurements of the leakage in Al/Al2O3/Al tunnel junctions show that the devices are suitable for qubit applications.
Keywords:Al/Al2O3/Al junctions   electron beam evaporation   superconducting qubit
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