| 氮化温度对ZnO薄膜结构特性的影响 |
| |
| 引用本文： | 张丽,于威,许贺菊,张锦川,傅广生.氮化温度对ZnO薄膜结构特性的影响[J].河北大学学报(自然科学版),2009,29(2):150. |
| |
| 作者姓名： | 张丽 于威 许贺菊 张锦川 傅广生 |
| |
| 作者单位： | 1.河北大学,物理科学与技术学院,河北,保定,071002； 2.华北煤炭医学院,基础部,河北,唐山,063000 |
| |
| 摘 要： | 采用螺旋波等离子体辅助射频磁控溅射技术,在蓝宝石(001)衬底上制备不同氮化温度的ZnO薄膜.结果表明,在200～600 ℃内, 不同的氮化温度对薄膜的表面形貌和晶格结构有显著影响.
|
| 关 键 词： | ZnO薄膜 氮化温度 晶格结构 |
Influence of Nitridation Temperature on the Microstructure of ZnO Films |
| |
| ZHANG Li,YU Wei,XU He-ju,ZHANG Jin-chuan,FU Guang-sheng.Influence of Nitridation Temperature on the Microstructure of ZnO Films[J].Journal of Hebei University (Natural Science Edition),2009,29(2):150. |
| |
| Authors: | ZHANG Li YU Wei XU He-ju ZHANG Jin-chuan FU Guang-sheng |
| |
| Institution: | 1.College of Physics Science and Technology;Hebei University;Baoding 071002;China;2.Department of Basic Medical;North China Coal Medical College;Tangshan 063000;China |
| |
| Abstract: | ZnO films were deposited on sapphire(001)substrates by helicon wave plasma assisted radio frequency magnetron sputtering at various nitridation temperature.Results show that the microstructure of ZnO film is sensitive to the change of nitridation temperature ranging from 200~600 ℃. |
| |
| Keywords: | ZnO film nitridation temperature crystal structure |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
| 点击此处可从《河北大学学报(自然科学版)》浏览原始摘要信息 |
| 点击此处可从《河北大学学报(自然科学版)》下载免费的PDF全文 |
|
