| 金刚石膜和氢化非晶碳膜电阻率测量的对比研究 |
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| 引用本文： | 胡颖,徐力,高著秀.金刚石膜和氢化非晶碳膜电阻率测量的对比研究[J].首都师范大学学报(自然科学版),2001,22(4):20-22,30. |
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| 作者姓名： | 胡颖 徐力 高著秀 |
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| 作者单位： | 首都师范大学物理系 |
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| 基金项目： | 北京市自然科学基金资助项目 2982011. |
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| 摘 要： | 对金刚石膜和氢化非晶碳膜的电阻率测试方法进行了对比研究，即对金刚石膜采用“大”尺度电极，氢化非晶碳膜采用“大”尺度电极和小尺度电极测量I－V曲线进行对比分析和讨论，得出了有意义的结果。
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| 关 键 词： | 金刚石膜 氢化非晶碳膜 电极测量 电阻率 金属－半导体－金属结构 电学性能 I－V特性曲线 |
Comparion Research of Measurement of Resistansity for Diamond Film and a-C:H Film |
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| Hu Ying,Xu Li,Gao Zhuxiu.Comparion Research of Measurement of Resistansity for Diamond Film and a-C:H Film[J].Journal of Capital Normal University(Natural Science Edition),2001,22(4):20-22,30. |
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| Authors: | Hu Ying Xu Li Gao Zhuxiu |
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| Abstract: | The measure method of resistansity of diamond film and a-C:H film are compared in this work. Large criterion electrode is applied to diamond film and both large and small criterion electrodes are applied to a-C:H film. The result of measurement of I-U curve is studied and discussed and significant outcome is derived. |
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| Keywords: | Diamond film a-C:H film Electrode resistansity rate Metal semiconductor metal structure |
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