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石墨烯专利技术国际研发态势分析
引用本文:马廷灿,万勇,冯瑞华. 石墨烯专利技术国际研发态势分析[J]. 科学观察, 2012, 0(3): 25-36
作者姓名:马廷灿  万勇  冯瑞华
作者单位:中国科学院国家科学图书馆武汉分馆(中国科学院武汉文献情报中心)
摘    要:石墨烯是物理学、化学、材料科学等领域近年来的研究热点之一。因其集优异的电学、力学、光学、化学和热学等性能于一身,石墨烯已经成为一个备受关注、竞争非常激烈的新兴技术领域,近年来全球相关专利申请数量持续快速增长。该文基于DII数据库,利用TDA、Aureka等分析工具,对全球石墨烯相关专利进行了分析,揭示了全球石墨烯相关专利技术的研发和竞争态势。

关 键 词:石墨烯  专利分析  研发态势

Patent Analysis on International Graphene Research and Development Trend
Ma Tingcan, Wan Yong, Feng Ruihua. Patent Analysis on International Graphene Research and Development Trend[J]. Science Focus, 2012, 0(3): 25-36
Authors:Ma Tingcan   Wan Yong   Feng Ruihua
Affiliation:Wuhan branch of National Library of Science (Wuhan Documentation and Information Center) , Chinese Academy of Sciences, Wuhan 430071
Abstract:Graphene is one of the recent research focuses in the fields of physics, chemistry, materials science, and etc. Its excellent electrical, mechanical, optical, chemical and thermal properties make graphene become a high-profile competitive emerging technology. And the number of global graphene patent applications gained sustained rapid growth in recent years. In this paper, based on the DII database, we made a patent analysis on international graphene patent applications, revealed global research and development trend in graphene patent technology with the help of TDA, Aureka and other tools.
Keywords:graphene  patent analysis  research and development trend
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