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| LiH薄膜制备技术进展 | |
| 引用本文： | 雷洁红,段浩,唐永建.LiH薄膜制备技术进展[J].四川理工学院学报(自然科学版),2010,23(4):491-493. |
| 作者姓名： | 雷洁红 段浩 唐永建 |
| 作者单位： | 1. 西华师范大学物理与电子信息学院,四川,南充,637002;中国工程物理研究院激光聚变研究中心,四川,绵阳,621900 2. 绵阳师范学院化学与化学工程学院,四川,绵阳,621000 3. 中国工程物理研究院激光聚变研究中心,四川,绵阳,621900 |
| 基金项目： | 国家高技术研究发展计划(863)资助课题 |
| 摘 要： | 纳米厚度、表面光滑的氢化锂薄膜的制备研究具有十分重要的意义。综述了氢化锂薄膜的制备方法:电阻蒸发法和磁控溅射法。比较研究后认为这两种制备方法制备的氢化锂薄膜,表面粗糙度高,不能达到软x射线多层膜的要求。而脉冲激光气相沉积法可以制备表面超光洁,厚度最小为几个纳米的薄膜,是制备表面光滑的薄膜的一种重要制备方法。 |
| 关 键 词： | 氢化锂薄膜 制备技术 表面粗糙度 脉冲激光气相沉积 |
Preparation Technology of Lithium Hydride Thin Film |
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| LEI Jie-hong,DUAN Hao,TANG Yong-jian.Preparation Technology of Lithium Hydride Thin Film[J].Journal of Sichuan University of Science & Engineering:Natural Science Editton,2010,23(4):491-493. | |
| Authors: | LEI Jie-hong DUAN Hao TANG Yong-jian |
| Abstract: | Research on preparation technology of lithium hydride thin films holding nanometer thickness and very glabrous surface plays an important part.The paper expects preparation technologies of lithium hydride films: evaporation deposition and sputtering deposition technology.After comparatively investigating,it was considered that the lithium hydride films made by two kinds of technologies couldn't meet demands of x-ray's multilayer film as their surfaces were quite rough.While plused laser deposition technology can fabricate films whose surfaces are quite glabrous and whose least thickness can achieve several nanometers,which is an important preparation technology to fabricate films holding glabrous surface. |
| Keywords: | lithium hydride thin film preparation surface roughness pulsed laser deposition |
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