| 大面积CVD金刚石膜的热铁板抛光 |
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| 引用本文： | 刘敬明,蒋政,张恒大,吕反修,唐伟忠. 大面积CVD金刚石膜的热铁板抛光[J]. 北京科技大学学报, 2001, 23(1): 42-44 |
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| 作者姓名： | 刘敬明 蒋政 张恒大 吕反修 唐伟忠 |
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| 作者单位： | 北京科技大学材料科学与工程学院, |
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| 基金项目： | 国家高技术研究发展计划(863计划);863-715-Z38-03; |
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| 摘 要： | 研制成功国内第1台大面积CVD金刚石膜热铁板抛光机，它可以在10^-3pa真空条件下，加热到1100℃；抛光台可以在0－10r/min间实现无级调速，一次完成3片φ110mm的金刚石膜的抛光，金刚石膜在980℃，2h抛光的结果表明该装置有良好的抛光效果。金刚石膜在980℃抛光不同时间的Raman谱表明，金刚石热铁板抛光是金刚石石墨化和C原子不断扩散的过程。
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| 关 键 词： | CVD金刚石膜 热铁板抛光 化学气相沉积法 石墨化 碳原子扩散 抛光速率 化学抛光 |
| 修稿时间： | 2000-08-28 |
Thermo-Chemical Polishing of Large Area CVD Diamond Films |
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| LIU Jingming,Jiang Zheng,ZHANG Hengda,Lv fanxiu,Tang Weizhong. Thermo-Chemical Polishing of Large Area CVD Diamond Films[J]. Journal of University of Science and Technology Beijing, 2001, 23(1): 42-44 |
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| Authors: | LIU Jingming Jiang Zheng ZHANG Hengda Lv fanxiu Tang Weizhong |
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| Abstract: | The first domestic thermo-chemical polishing apparatus is setup. Three 110 mm in diameter diamond films can be polished simultaneously at 103 Pa from 750℃ to 1 100℃, with the polishing rate increasing with increasing temperature. The results of polishing at 980℃showed that polishing of CVD diamond films is very efficient. Thermo-chemical polishing mechanism is based on the transformation of diamond into graphite and the atomic dissolution of carbon into a hot metal. |
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| Keywords: | CVD diamond films thermo-chemical polishing graphite diffusion |
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