雾化施液CMP工艺及实验设备

针对传统化学机械抛光的平坦化制程中抛光液使用量大和环保等问题，提出了一种利用超声波雾化抛光液进行抛光的工艺方法。介绍了试验台架搭建、工艺处理方法、工作原理和抛光工艺，并与传统化学机械抛光效果进行了比较。研究表明，在表面质量上，雾化工艺能够达到传统化学机械抛光的量级，其使用量是传统化学机械抛光的1／10。

Study on the Process and Experimental Equipment of Atomizing Slurry Applied Chemical Mechanical Polishing

For the slurry usage and environmental problems of the traditional chemical mechanical polishing（CMP） planarization polishing,we put forward a processing method of polishing slurry by ultrasonic atomization. It introduces the test platform built method, principle and polishing process, and compares with the traditional chemical mechanical polishing effect. This indicates that on the surface quality,the atomization process can achieve the level of the traditional chemical mechanical polishing with the traditional CMP 1/lO.