高温均质化退火对NiPtB合金组织及溅射成膜性能的影响

利用真空熔炼技术制备NiPtB合金铸锭，分别采用直接中温轧制和高温均质化退火+中温轧制对该合金铸锭进行处理，分析对比两种处理手段对NiPtB合金铸锭组织与性能的影响。结果表明：合金铸态组织的不均匀性难以通过直接中温轧制消除；高温均质化退火可使NiPtB合金组织更加均匀；退火后的NiPtB合金经轧制后，组织均匀性提升，轧面晶粒主要为{100}和{111}取向；相比于直接轧制态，退火+轧制态样品具有更高的硬度和更好的溅射成膜性能。

Effect of High Temperature Homogenization Annealing on Microstructure and Sputtering Film Formation Performance of NiPtB Alloy

The NiPtB alloy ingot was prepared by vacuum melting technology, and treated by direct medium temperature rolling and high temperature homogenization annealing + medium temperature rolling, respectively. The effects of two treatment methods on the microstructure and properties of NiPtB alloy ingot were analyzed and compared. The results show that the inhomogeneity of as-cast microstructure is difficult to be eliminated by direct medium temperature rolling. High temperature homogenization annealing can make the structure of NiPtB alloy more uniform. The microstructure uniformity of annealed NiPtB alloy is improved after rolling, and the grain orientation of rolled surface is mainly {100} and {111}. Compared with the direct rolling state, the annealed + rolled specimen has higher hardness and better sputtering film performance.