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隧道量子对称结的制备工艺、特性和Swihart模
引用本文:刘必荣. 隧道量子对称结的制备工艺、特性和Swihart模[J]. 安徽大学学报(自然科学版), 1997, 21(1): 27-31
作者姓名:刘必荣
作者单位:安徽大学自动化系
摘    要:本文研究隧道量子对称结的制备工艺和阳极氧化电压谱图特性(AVS),发现亲近效应消失,高质量结在势垒厚度大于7nm时获得。同时推演了结的Swihart模,讨论并代入参量计算比较,证实结内Swihart模的必然存在

关 键 词:量子对称结,Swihart模

Fabrication Process, Charactoristic and Swihart Mode for Tuneling Quantum Symmetrical Junctions
Liu Birong. Fabrication Process, Charactoristic and Swihart Mode for Tuneling Quantum Symmetrical Junctions[J]. Journal of Anhui University(Natural Sciences), 1997, 21(1): 27-31
Authors:Liu Birong
Abstract:In this paper, fabrication process and characteristic of Anodisation Voltage Spectroscopy in tunneling quantum junctions are studied. It is discovered that the proximity effect is not existent and the minimal optimum thickness of deposition Al layer for high quality junctions. By calculating, discussing and comparing it is confirmed that the Swihart mode is inevitably existent.
Keywords:quantum symmetrical junction   Swihart mode
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