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40Cr基体与TiN膜层界面微观结构研究
引用本文:刘一梅,王亮,等.40Cr基体与TiN膜层界面微观结构研究[J].佳木斯大学学报,2001,19(1):5-8.
作者姓名:刘一梅  王亮
作者单位:大连海事大学!辽宁大连116026
摘    要:在40Cr基体上镀TiN,存在膜基结合不牢的问题,作者前期工作已证实在镀TiN膜前先进行离子渗氮予处理,可以提高膜基结合力,本文从微观的方面对这一机理进行研究,膜层与膜基界面的透射电镜观察结果表明,40Cr基体经离子渗氮后再镀TiN,膜层晶粒细小、均匀、膜基结合紧密。

关 键 词:离子渗氮  微观  机理  膜基界面  氮化钛  
文章编号:1008-1402(2001)01-0005-04
修稿时间:2001年1月8日

STUDY ON SUBSTRUCTURE OF INTERFACE BETWEEN 40Cr MATRIX AND TiN FILM
Liu Yi-Mei,Wang Liang,Hei Zu-Kun.STUDY ON SUBSTRUCTURE OF INTERFACE BETWEEN 40Cr MATRIX AND TiN FILM[J].Journal of Jiamusi University(Natural Science Edition),2001,19(1):5-8.
Authors:Liu Yi-Mei  Wang Liang  Hei Zu-Kun
Abstract:There is a problem that coating can't bind tightly with the 40Cr matrix on which TiN film is ion-plated. Previous experience has proved that binding force between the film and matrix can be increased through ion-nitriding technique before ion-plating. This article studies the micro-mechanism from the point of microstructure. TEM and XTEM results show that crystal grains in the film is fine and the film are bound to the matrix tightly through ion-nitriding before ion-plating TiN on 40Cr.
Keywords:Cr  TiN  ion-nitriding  micro-mechanism  interface between film and matrix
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