| 反应磁控溅射制备五氧化二铌光学薄膜 |
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| 引用本文： | 赖发春,瞿燕,盖荣权. 反应磁控溅射制备五氧化二铌光学薄膜[J]. 福建师范大学学报(自然科学版), 2004, 20(4): 46-49 |
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| 作者姓名： | 赖发春 瞿燕 盖荣权 |
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| 作者单位： | 福建师范大学物理与光电信息科技学院,福建,福州,350007 |
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| 基金项目： | 福建省自然科学基金重点资助项目(E030002)，福建省科技厅基金资助项目(K04023) |
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| 摘 要： | 利用低频反应磁控溅射制备五氧化二铌光学薄膜.薄膜的微结构、表面形貌和光学性质等分别采用X射线衍射、场发射扫描电子显微镜、原子力显微镜和紫外可见近红外分光光度计等观察和测量.测量发现溅射制备的光学薄膜为非晶结构,具有很好的表面平整度,厚度为515nm,光学波长为550nm处的折射率为2.264,可见光波段的消光系数小于10-3,光学带隙为3.49eV.结果表明制备的五氧化二铌膜是性能良好的光学薄膜.
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| 关 键 词： | 五氧化二铌 光学薄膜 特性 |
| 文章编号： | 1000-5277(2004)04-0046-04 |
| 修稿时间： | 2004-02-11 |
Deposition Niobium Oxide Optical Thin Films by Low Frequency Reactive Magnetron Sputtering |
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| LAI Fa-chun,QU Yan,GAI Rong-quan. Deposition Niobium Oxide Optical Thin Films by Low Frequency Reactive Magnetron Sputtering[J]. Journal of Fujian Teachers University(Natural Science), 2004, 20(4): 46-49 |
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| Authors: | LAI Fa-chun QU Yan GAI Rong-quan |
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| Abstract: | Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system. The microstructure, morphology and optical properties of the films were investigated by X-ray diffraction, field-emission scanning electron microscope and optical transmittance. Niobium oxide films are amorphous and the surface is very smooth. Additionally, the refractive index of the films at wavelength of 550 nm is 2.264 and extinction coefficients are lower than 10~(-3) when the wavelengths are larger than 400 nm. The optical band gap is 3.49 eV. The prepared films are good for optical applications. |
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| Keywords: | Niobium oxide optical thin films properties |
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