| 脉冲激光沉积技术 |
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| 引用本文： | 王萍,解廷月,李海. 脉冲激光沉积技术[J]. 山西大同大学学报(自然科学版), 2008, 24(4): 19-22 |
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| 作者姓名： | 王萍 解廷月 李海 |
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| 作者单位： | 山西大同大学物理与电子科学学院,山西大同037009 |
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| 基金项目： | 山西大同大学校科研和教改项目 |
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| 摘 要： | 薄膜技术作为一种有效的手段为材料的集成和器件的制备提供了坚实的基础.本文主要介绍脉冲激光沉积技术的基本原理、特点、优点和缺点.该方法尤其适合用来生长多组分、化学结构复杂的过渡金属氧化物薄膜.
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| 关 键 词： | 脉冲激光沉积 薄膜技术 |
An Overview of the Pulsed Laser Depsition Technology |
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| WANG Ping,XIE Ting-yue,LI Hai. An Overview of the Pulsed Laser Depsition Technology[J]. Journal of Shanxi Datong University(Natural Science Edition), 2008, 24(4): 19-22 |
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| Authors: | WANG Ping XIE Ting-yue LI Hai |
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| Affiliation: | WANG Ping, XIE Ting-yue, LI Hal (School of Physics and Electronic Science, Shanxi Datong University, Datong Shanxi, 037009) |
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| Abstract: | Thin film technology is a powerful method to realize the material integration and device fabrication. In this paper, we mainly introduce the basic principle, characters, merits and demerits of the pulsed laser deposition （PLD） technique. The PLD technology is most suitable for the thin film growth of the transition metal oxides with multi-component and complex chemical structure. |
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| Keywords: | pulsed laser deposition thin film technology |
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