| 激光直接刻蚀图形的质量分析 |
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| 引用本文： | 徐则川,刘书龙,安承武. 激光直接刻蚀图形的质量分析[J]. 华中科技大学学报(自然科学版), 1997, 0(3) |
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| 作者姓名： | 徐则川 刘书龙 安承武 |
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| 作者单位： | 激光技术国家重点实验室 |
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| 基金项目： | 国家高技术研究发展计划（863－715－18－02－02）及华中理工大学激光技术国家重点实验室资助 |
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| 摘 要： | 在激光剥离机制的基础上，分析了激光直接刻蚀过程中，蒸气压及热传导对图形刻蚀质量的影响，并得出了刻蚀不同厚度Ａｌ膜的激光能量密度、脉冲频率和刻蚀脉冲数的最佳组合．对Ｔａｌｂｏｔ成像法中对比度对图形刻蚀质量的影响也进行了分析
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| 关 键 词： | 准分子激光；直接刻蚀；图形质量 |
A Quality Analysis of Direct Etching with an Excimer Laser |
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| Xu Zechuan Dept. of Solid State Electronics,HUST,Wuhan ,China. Liu Shulong An Chengwu. A Quality Analysis of Direct Etching with an Excimer Laser[J]. JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE, 1997, 0(3) |
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| Authors: | Xu Zechuan Dept. of Solid State Electronics HUST Wuhan China. Liu Shulong An Chengwu |
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| Affiliation: | Xu Zechuan Dept. of Solid State Electronics,HUST,Wuhan 430074,China. Liu Shulong An Chengwu |
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| Abstract: | Based on the laser ablation mechanism, the effect of vapor pressure and thermal conduction on the quality of pattern etching in direct etching with an excimer laser is analyzed. The optimal combinations of laser energy density, pulse frequency and repetition number are obtained for Al thim film of various thicknesses. For Talbot imaging, the effect of contrast on the quality of the pattern etched is also discussed. |
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| Keywords: | excimer laser direct etching pattern quality |
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