| 射频反应溅射非晶硅基薄膜的红外谱 |
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| 引用本文： | 王印月,吴现成.射频反应溅射非晶硅基薄膜的红外谱[J].兰州大学学报(自然科学版),1995,31(2):55-59. |
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| 作者姓名： | 王印月 吴现成 |
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| 作者单位： | 兰州大学物理学系，兰州铁道学院 |
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| 摘 要： | 本文研究了用射频反溅射法制备的非晶硅基系列薄膜（ａ－Ｓｉ：Ｈ，ａ－ＳｉＣｘ：Ｈ，ａ－ＳｉＮｘ：Ｈ和ａ－ＳｉＣｘＮｙ：Ｈ）的红外吸收谱，对其中的主要吸收区进行了分析和讨论。
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| 关 键 词： | 反应溅射 薄膜 红外吸收 非晶硅基 红外光谱 |
IR Spectra of Hydrogenated Amorphous Silicon-based Films Made by RF Reactive-Sputtering |
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| Wangyinyue, Wu Xiancheng, Wang Huiyao, Chen Guanghua.IR Spectra of Hydrogenated Amorphous Silicon-based Films Made by RF Reactive-Sputtering[J].Journal of Lanzhou University(Natural Science),1995,31(2):55-59. |
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| Authors: | Wangyinyue Wu Xiancheng Wang Huiyao Chen Guanghua |
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| Abstract: | We have investigated infrared absorption spectra of hydrogenated amorphous silicon-based films made by rf reactive-sputtering (a-Si : H, a-SiCx : H, a-SiNx : H and a-SiCxNy : H). Several principal absorption regions are analysed and discussed. |
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| Keywords: | reaction-sputtering film infrared absorption |
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