| GaAs／Si弹性形变及其应力的理论模型 |
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| 引用本文： | 钱文生,李明祥.GaAs／Si弹性形变及其应力的理论模型[J].东南大学学报(自然科学版),1995,25(6):136-139. |
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| 作者姓名： | 钱文生 李明祥 |
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| 作者单位： | 东南大学微电子中心 |
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| 摘 要： |
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| 关 键 词： | 砷化镓 硅 弹性形变 应力 薄膜 |
Theoretical Model of GaAs/Si Elastic Deformation and Stress |
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| Qian Wensheng ,Li Mingxiang, Xia Hailiang,Wei Tongli.Theoretical Model of GaAs/Si Elastic Deformation and Stress[J].Journal of Southeast University(Natural Science Edition),1995,25(6):136-139. |
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| Authors: | Qian Wensheng Li Mingxiang Xia Hailiang Wei Tongli |
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| Abstract: | In this paper,the elastic deformation caused by the thermal expansion coefficients mis-match of GaAs and Si is discussed,the stress distribution in GaAs/Si is described,and the method forcalculating the average stress density on the basis of its curvity is given. |
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| Keywords: | elastic deformation stresses thin films |
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