SiO2纳米颗粒对电化学沉积半金属Bi膜的影响

研究了SiO2纳米颗粒对电化学沉积半金属Bi膜沉积过程和膜形貌、结构的影响。利用I-V循环扫描曲线分析了未掺与掺入SiO2纳米颗粒后薄膜沉积过程的电化学特性，应用扫描电子显微镜（SEM）和X射线衍射（XRD）对膜的微观表面形貌及相结构进行了表征。实验结果表明。加入SiO2纳米颗粒引起电沉积过程中还原电势向正电位方向移动，使Bi^3＋离子的还原沉积更容易，但不对Bi膜的溶解电位产生明显影响。加入SiO2纳米颗粒后能显著影响沉积膜的形貌，其有明显细化晶粒的效果。总之，SiO2纳米颗粒的加入及加入量显著影响Bi膜的电化学沉积过程和形貌、结构。

Fabrication of Semimetal Bi Films with Embedded SiO2 Nanoparticles by Electrodeposition

Electrodeposition of bismuth thermoelectric films and the influence of co-deposited SiO_2 nanoparticles on the morphology and structure of deposited films were studied.Electrochemical deposition processes were analyzed through I-V curves.SEM and XRD were used to examine and identify the morphology and crystal structure of the films.The co-deposition of SiO_2 nanoparticles caused the shift of deposition potential toward more positive potential,resulting in the easier reduction of Bi~(3+) ion;meanwhile,the stripping potential of Bi films kept unchanged.When a certain volume ratio of SiO_2 nanoparticles were added,the morphology of deposited films changed obviously,and grain size of the film decreased greatly,resulting in the broaden of the diffraction peaks in XRD pattern.Our experiments shown that co-deposition of nanoparticles would influence the electrodeposition process,morphology and structures of deposited Bi films markedly.