| 陶瓷薄膜的气相制备及热力学应用 |
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| 引用本文： | 李先林,郝俊杰,刘连顺.陶瓷薄膜的气相制备及热力学应用[J].河北理工大学学报（自然科学版）,2001,23(Z1). |
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| 作者姓名： | 李先林 郝俊杰 刘连顺 |
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| 作者单位： | 1. 河北理工学院 材料系,
2. 唐山白玉瓷厂, |
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| 摘 要： | 综述了通过气相法制备陶瓷薄膜的方法,介绍了热力学在薄膜生成时的应用,讨论了基片温度和沉积速率对薄膜结构的影响,并对薄膜与基片间的结合问题进行了简单论述。
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| 关 键 词： | 薄膜 化学气相沉积 物理气相沉积 |
The manufacture of thin film by vapro method & the application of thermodynamics in this field |
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| LI Xian-lin,HAO Jun-jie,LIU Lian-shun.The manufacture of thin film by vapro method & the application of thermodynamics in this field[J].Journal of Hebei Institute of Technology(Natural Science Edition),2001,23(Z1). |
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| Authors: | LI Xian-lin HAO Jun-jie LIU Lian-shun |
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| Abstract: | The methods of CVD(Chemical Vapor Deposition) & PVD (Physical vapor Deposition)were reviewed,and the application of thermodynamics in making thin film was introduced.Then,the effects of two important factors,the temperature and deposition rate,were discussed respectively.In addition,the combination of substrate and thin film was studied briefly. |
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