| 直流磁控溅射铬膜附着性的影响因素研究 |
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| 引用本文： | 刘宗贺,方雪冰,刘波,凌味未.直流磁控溅射铬膜附着性的影响因素研究[J].实验科学与技术,2006,4(1):31-32,43. |
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| 作者姓名： | 刘宗贺 方雪冰 刘波 凌味未 |
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| 作者单位： | 1. 深圳深爱半导体有限公司,深圳,518029
2. 电子科技大学,成都,610054 |
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| 摘 要： | 讨论了采用直流磁控溅射法在锆合金表面镀铬时，基体的粗糙度、退火工艺、薄膜厚度及溅射前的基体离子轰击对铬薄膜附着性的影响。以自动划痕测试仪测试样品的膜/影基结合力，结果表明：退火处理能大幅度增强铬膜的附着性；薄膜厚度的增加却会使其附着性降低；而基体粗糙度对附着性并无大的影响。
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| 关 键 词： | 直流磁控溅射 铬膜 附着性 表面粗糙度 退火 膜厚 离子轰击 |
| 文章编号： | 1672-4550（2006）01-0031-03 |
| 收稿时间： | 2005-09-02 |
| 修稿时间： | 2005-09-20 |
Study of Effects on Adhesion of Cr Films Deposited by D.C Magnetron Sputtering |
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| Liu Zonghe,Fang Xuebing,Liu Bo,Ling Weiwei.Study of Effects on Adhesion of Cr Films Deposited by D.C Magnetron Sputtering[J].Experiment Science & Technology,2006,4(1):31-32,43. |
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| Authors: | Liu Zonghe Fang Xuebing Liu Bo Ling Weiwei |
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| Abstract: | To improve the erosion resistance ot zircomum alloy, magnetron sputtering. The effects on adhesion of Cr films such as matrix alloy surface roughness, annealing process, film thickness and ion bombardment on matrix alloy have been studied. The adhesion of Cr films have been tested by scarification, the result proved that adhesion of Cr films can be markedly enhanced by annealing process and be reduced with the increase of film thickness while the surface roughness of matrix alloy has little effect on the adhesion. |
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| Keywords: | DC magnetron sputtering Cr films adhesion surface roughness anneal filmthickness ion bombardment |
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