| 磁控溅射制备参数对 ZnO:Al电学性能的影响 |
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| 引用本文： | 殷胜东,马勇,籍勇亮. 磁控溅射制备参数对 ZnO:Al电学性能的影响[J]. 淮北煤炭师范学院学报(自然科学版), 2006, 27(1): 16-21 |
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| 作者姓名： | 殷胜东 马勇 籍勇亮 |
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| 作者单位： | 重庆师范大学物理学与信息技术学院,重庆,400047 |
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| 基金项目： | 重庆市教委科研基金资助项目(040810) |
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| 摘 要： | ZnO:Al(ZAO)透明导电薄膜是一种n型半导体,有高的载离子浓度和大的光学禁带宽度,具有优异的电学和光学性能,有极广的应用前景.本文介绍了ZAO薄膜的广泛用途和今后研究的趋势,并着重分析了磁控溅射制备参数对电学性能的影响.
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| 关 键 词： | ZAO薄膜 电学性能 磁控溅射 |
| 文章编号： | 1672-7177(2006)01-0016-06 |
| 修稿时间： | 2005-11-01 |
Effect of Magnetron Sputtering Growth Parameters on Electrical Properties of ZnO:Al |
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| YIN Sheng-dong,MA Yong,JI Yong-liang. Effect of Magnetron Sputtering Growth Parameters on Electrical Properties of ZnO:Al[J]. Journal of Huaibei Coal Industry Teachers College(Natural Science edition), 2006, 27(1): 16-21 |
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| Authors: | YIN Sheng-dong MA Yong JI Yong-liang |
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| Abstract: | Transparent conductive ZnO:Al(ZAO) thin films are semi-conductor oxides with both high carrier concentration and large optical band gap.ZAO films have outstooding electrical and optical properties,and are emerging as a most potential alternative candidate for transparent conducting material.The applications and the proposal for the future research of ZAO are described.The effect of growth parameters on the properties are mostly analysed. |
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| Keywords: | ZAO films electrical properties magnetron sputtering |
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