| 活性单体对聚氨酯丙烯酸酯混杂体系感度的影响 |
| |
| 引用本文： | 孙芳,曾宪玉,张文政,黄毓礼.活性单体对聚氨酯丙烯酸酯混杂体系感度的影响[J].北京化工大学学报(自然科学版),2004,31(2):66-68. |
| |
| 作者姓名： | 孙芳 曾宪玉 张文政 黄毓礼 |
| |
| 作者单位： | 北京化工大学,理学院,北京,100029;北京化工大学,材料科学与工程学院,北京,100029;沈阳化工学院材料科学与工程学院,沈阳,110142 |
| |
| 基金项目： | 国家自然科学基金
,
北京化工大学校科研和教改项目 |
| |
| 摘 要： | 双官能度自由基型活性单体TEGDA在聚氨酯丙烯酸酯PU与环氧化合物EPON-812组成的混杂光固化体系中质量比为m(TEGDA)∶m(PU) =1∶2时,体系综合性能好,感度较高,感度值为15. 2J/m2, 带有叔胺结构的活性稀释单体NVP的加入不利于提高混杂体系的感度, 感度值为196.6J/m2 。混杂光固化体系中活性单体的选择, 同时考虑其对自由基和阳离子两种聚合的影响.
|
| 关 键 词： | 聚氨酯丙烯酸酯 光固化 混杂 |
| 收稿时间： | 2003-09-29 |
| 修稿时间： | 2003年9月29日 |
Effect of reactive monomers on photosensitivity of polyurethane acrylate hybrid UV-curing system |
| |
| Sun Fang,Zeng Xian yu,Zhang Wen zheng,Huang Yu li.Effect of reactive monomers on photosensitivity of polyurethane acrylate hybrid UV-curing system[J].Journal of Beijing University of Chemical Technology,2004,31(2):66-68. |
| |
| Authors: | Sun Fang Zeng Xian yu Zhang Wen zheng Huang Yu li |
| |
| Institution: | 1 College of Science, 2 College of Materials Science and Engineering, Beijing University of Chemical Technology, Beijing 100029, China; 3 College of Meterials Science and Engineering, Shenyang Institute of Chemical Technology, Shenyang 110142, China |
| |
| Abstract: | When the weight ratio of triethyleneglycol diacrylic ester (TEGDA) to polyurethane acrylate oligomer (PU) was 1∶2, the photosensitivity of the hybrid UV-curing system composed of PU and epoxy compound EPON-812 was amplified and the value of photosensitivity was 15.2J/m2. Addition of N-Vinylpyrrolidone (NVP), the radical reactive monomer with tert amine group,decreased the photosensitivity of the hybrid system and the value of photosensitivity was 196-6J/m2. The effect of the reactive monomers on radical and cationic polymeriation in the hybrid UV-curing system should be considered simultaneously. |
| |
| Keywords: | polyurethane acrylate UV curing hybrid |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
| 点击此处可从《北京化工大学学报(自然科学版)》浏览原始摘要信息 |
| 点击此处可从《北京化工大学学报(自然科学版)》下载免费的PDF全文 |
|
