| 辅以动态氮离子轰击的氩离子束溅射沉积PTFE高分子膜 |
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| 引用本文： | 李有宏,龙振湖.辅以动态氮离子轰击的氩离子束溅射沉积PTFE高分子膜[J].大连理工大学学报,1997,37(2):208-211. |
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| 作者姓名： | 李有宏 龙振湖 |
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| 作者单位： | 大连理工大学三束材料改性国家重点实验室 |
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| 基金项目： | 核工业总公司“八五”科技攻关项目 |
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| 摘 要： | 用辅以动态氮离子轰击的氩离子束溅射沉积方法，在３０４不锈钢基材上沉积聚四氟乙烯薄膜。经ＸＰＳ和ＩＲＳ分析，确定了聚四氟乙烯膜的存在并进行了结构分析。划痕试验表明：这种方法制成的聚四氟乙烯膜与基材之间有较好的结合力。
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| 关 键 词： | 薄膜 聚四氟乙烯 离子束溅射沉积 离子束轰击 |
PTFE film prepared by Ar + sputtering deposition with simultaneous N + bombardment |
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| Li Youhong,Long Zhenhu,Gong Zexiang,Ren Chunsheng.PTFE film prepared by Ar + sputtering deposition with simultaneous N + bombardment[J].Journal of Dalian University of Technology,1997,37(2):208-211. |
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| Authors: | Li Youhong Long Zhenhu Gong Zexiang Ren Chunsheng |
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| Abstract: | Polytetrafluoroethylene(PTFE) film on 304 stainless steel was formed by using Ar + sputtering deposition with N + bombarding the substrate surface simultaneously. XPS and IRS analyses confirmed that PTFE film was formed on the surface of 304 stainless steel substrate. The structure of the film thus formed is interpreted according to the XPS and IRS spectra analyses. Scratch test shows that the film has better adhesion with the substrate than that produced without N + bombardment. |
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| Keywords: | ion beams sputtering vacuum deposition thin films |
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