| 离子化乙炔气体淀积类金刚石薄膜 |
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| 引用本文： | 郑海涛.离子化乙炔气体淀积类金刚石薄膜[J].西安交通大学学报,1986(2). |
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| 作者姓名： | 郑海涛 |
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| 作者单位： | 西安交通大学电子工程系 |
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| 摘 要： | 我们用气体离子化淀积技术制得类金刚石薄膜,并研究了使用乙炔气体时的工艺条件。薄膜的性能与淀积过程中的加速电压、基片温度、磁感应强度等条件密切相关。在某种条件下薄膜的威氏硬度可大于兰宝石,并在电绝缘、耐腐蚀性等方面接近金刚石的性能。
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| 关 键 词： | 乙炔 气相沉积 金刚石 薄膜 |
DIAMOND-LIKE FILMS PREPARED BY IONIZED ACETYLENE DEPOSITION TECHNIQUE |
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| Zheng Haitao.DIAMOND-LIKE FILMS PREPARED BY IONIZED ACETYLENE DEPOSITION TECHNIQUE[J].Journal of Xi'an Jiaotong University,1986(2). |
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| Authors: | Zheng Haitao |
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| Institution: | Zheng Haitao Department of Electronic Engineering |
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| Abstract: | Diamond-like thin films have been prepared by ionized gas deposition tech-nique, ans the teehnical conditions in the case of acetylene is studied. Propertiesof these films depend on deposition conditions, such as acceleration voltage,substrate temperature, and intensity of magnetization. under certain conditions,the vickers hardness of these films shows a larger value than that of sapphire;their electrical insulation properties and corrosion resistance are cloes to those ofdiamonds. |
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| Keywords: | Acetylene Vapar phase Deposition Diamond Thin Films |
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