| 基于导体槽内电位计算的求解技术分析 |
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| 引用本文： | 蒋泽,赵为粮. 基于导体槽内电位计算的求解技术分析[J]. 重庆邮电大学学报(自然科学版), 2001, 13(3): 74-77 |
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| 作者姓名： | 蒋泽 赵为粮 |
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| 作者单位： | 重庆邮电学院 |
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| 摘 要： | 给出了导体槽内静态场电位计算的2种方法,在此基础上,比较了2种方法的解及其适应性.基于殂态场中电位函数的唯一性定理,分析了他们之间的等价关系,进而说明了应根据不同的边界结构采用不同求解技术.
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| 关 键 词： | 边值问题；迭加原理；唯一性定理 |
| 文章编号： | 1004-5694(2001)03-0074-04 |
| 收稿时间： | 2000-04-01 |
| 修稿时间： | 2000-04-01 |
The Solving Process Analysis Based on the Solutions of the Potential Distribution in Conducting Trough |
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| JIANG Ze,ZHAO Wei-liang. The Solving Process Analysis Based on the Solutions of the Potential Distribution in Conducting Trough[J]. Journal of Chongqing University of Posts and Telecommunications, 2001, 13(3): 74-77 |
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| Authors: | JIANG Ze ZHAO Wei-liang |
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| Affiliation: | Institute of Optical Electronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China |
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| Abstract: | In this paper,some classic methods are used to solve the potential distribution in the conducting trough and their adaptability is analyzed based on the results. Furthermore, with the uniqueness theorem, the solution''s equivalence is analysed and the adaptable ways of solving different boundary configuration are suggested according to the boundary configuration for decreasing the complexity. |
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