| 氧化锌的XRD和TG—DTA分析 |
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| 引用本文： | 张永强,李永. 氧化锌的XRD和TG—DTA分析[J]. 河南教育学院学报(自然科学版), 2009, 18(4): 25-27. DOI: 10.3969/j.issn.1007-0834.2009.04.011 |
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| 作者姓名： | 张永强 李永 |
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| 作者单位： | 河南教育学院化学系,河南郑州,4500416 |
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| 基金项目： | 教育部留学回国人员科研启动基金 |
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| 摘 要： | 应用恒电流电化学沉积技术，在阴极表面得到ZnO薄膜，并就电流密度、沉积时间、电解液浓度和反应温度等电化学沉积工艺条件对薄膜材料的组成及结构的影响进行了讨论．
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| 关 键 词： | ZnO XRD TG—DTA |
Analysis about Zinc Oxide With XRD and TG-DTA |
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| ZHANG Yongqiang,LI Yong. Analysis about Zinc Oxide With XRD and TG-DTA[J]. Journal of Henan Education Institute(Natural Science Edition), 2009, 18(4): 25-27. DOI: 10.3969/j.issn.1007-0834.2009.04.011 |
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| Authors: | ZHANG Yongqiang LI Yong |
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| Affiliation: | ( Department of Chemistry, Henan Institute of Education, Zhengzhou 450046, China) |
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| Abstract: | ZnO thin film was prepared on cathode by using galvanostatic elctrodeposition technique. Discussed the effects of conditions of elctrodeposition technique such as current densities, deposition time, electrolyte concentration and solution temperature on the composition and structure of the films. |
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| Keywords: | ZnO XRD TG-DTA |
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