| 四甲基硅共振增强多光子电离的质谱的机理研究 |
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| 引用本文： | 施德恒
,刘新建.四甲基硅共振增强多光子电离的质谱的机理研究[J].信阳师范学院学报(自然科学版),1993(1). |
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| 作者姓名： | 施德恒 刘新建 |
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| 摘 要： | 本文利用TOF质谱仪研究了TMS的REMPI机理.首次获得了371.00～378.00nm范围内若干个波长点处的TOF质谱,得出了此波段内TMS的REMPI机理为B类光化学行为的结论.对C_2~+的形成机理也给予了简短的讨论.
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| 关 键 词： | TMS TOF质谱 REMPI机理 B类光化学行为 A类光化学行为 |
Mass Spectrum Study on MPI Machanism of TMS |
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| Shi Deheng Liu Xinjian.Mass Spectrum Study on MPI Machanism of TMS[J].Journal of Xinyang Teachers College(Natural Science Edition),1993(1). |
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| Authors: | Shi Deheng Liu Xinjian |
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| Institution: | Shi Deheng Liu Xinjian |
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| Abstract: | In this paper, time-of-flight ( TOF ) mass spectrum apparatus is used to investigat'e the machanism of resonant enhanced mul tiphoton. ionization (REMPI) of tetramethylsilicane (TMS ) . TOF mass
spectra of some wavelengths ars gained in the 371.00-378.00nm
region for the first time. We conclude that REMPI machanism of TMS is B photochemical behavior. Furthermore, we have a short discussion about machanism of C2+ formation. |
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| Keywords: | TMS REMPI TOF spectrum B photochemical behavior A photochemical behavior |
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