| 反应阴极弧镀过程中N_2流量与弧电流强度对TiN镀层的影响 |
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| 引用本文： | 张际先.反应阴极弧镀过程中N_2流量与弧电流强度对TiN镀层的影响[J].江苏大学学报(自然科学版),1995(6). |
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| 作者姓名： | 张际先 |
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| 作者单位： | 江苏理工大学农机学院 |
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| 摘 要： | 研究了反应阴极弧镀过程中Ｎ２流量及弧电流强度对Ｔｉ阴极耗损率的影响，以及Ｎ２耗损与Ｔｉ阴极耗损间的关系，并对各种情况下的镀层进行结构分析。试验表明Ｔｉ阴极耗损率与Ｎ２流量有关，且在弧镀过程中，只要保持Ｎ２在真空室中有一定的压力，单位时间内Ｎ２耗损的原子数与Ｔｉ阳极耗损的原子数的比约为１：１．镀层沉积速度与结构取决于Ｎ２流量和弧电流强度。
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| 关 键 词： | 镀膜 真空电弧 阴极 |
Effect of N2 Flow and Arc Current on TiN Coating in Reactive Cathodic Arc Deposit |
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| Zhang Jixian.Effect of N2 Flow and Arc Current on TiN Coating in Reactive Cathodic Arc Deposit[J].Journal of Jiangsu University:Natural Science Edition,1995(6). |
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| Authors: | Zhang Jixian |
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| Institution: | Zhang Jixian |
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| Abstract: | The Ti cathode erosion rate and the relationship between N2 con-sumption and Ti cathode weight loss on different arc current and N2 flow are in-vestigated.The coatings under different conditions are analyzed by X-ray diffrac-tion.Results show that Ti cathode erosion rate is related to the N,flow,and the ratio of N to Ti atom consumption is about 1:1 if there is a N2 partial pressure in the chamber in reactive cathodic arc deposit.The TiN deposit rate and its struc-ture depend on arc current and N2 flow. |
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| Keywords: | coating film vacuum arc cathode |
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