| 宽束冷阴极离子源工作中电荷积累的影响和中和方法 |
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| 引用本文： | 古克义,邬晶,秦英. 宽束冷阴极离子源工作中电荷积累的影响和中和方法[J]. 科技信息, 2009, 0(3) |
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| 作者姓名： | 古克义 邬晶 秦英 |
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| 作者单位： | 西安工业大学光电工程学院; |
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| 摘 要： | 离子束辅助镀膜沉积过程中,绝缘工件上的电荷积累效应严重影响了薄膜质量,本文提出了电荷积累的危害,并且提出了三种中和办法,以消除薄膜表面的放电现象。最后经过实验证明分时中和可以很好的抑制电荷积累现象。
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| 关 键 词： | 宽束冷阴极离子源 电荷积累 中和 |
Disservice of the Charge accumulation and the way to accumulate |
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| Gu Keyi Wu Jing Qin Ying. Disservice of the Charge accumulation and the way to accumulate[J]. Science, 2009, 0(3) |
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| Authors: | Gu Keyi Wu Jing Qin Ying |
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| Affiliation: | School of Optoelectronic Engineering;Xi'an Technological University;Xi'an;710032;China |
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| Abstract: | In the process of IBAD,charges accumulate on the insulation works,this Seriously impact the quality of the films.In this paper,three ways were pointed out to eliminate the Discharge on the surface of the film. |
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| Keywords: | Broad beam cold cathode ion source Charge accumulation accumulate |
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