V掺杂对类金刚石薄膜性能的影响

通过磁控溅射的方法，使用石墨靶、V靶复合拼接靶，以氩气作为辅助气体，成功制备了不同原子分数的V掺杂类金刚石薄膜。采用拉曼光谱仪、电子探针X射线显微分析仪、X射线光电子能谱仪、原子力显微镜、扫描电子显微镜、纳米压痕仪、薄膜应力仪、往复摩擦磨损试验机等设备研究了V掺杂对类金刚石薄膜微观结构、力学性能、摩擦学性能的影响。结果表明，V掺杂提高了类金刚石薄膜的力学性能，当薄膜中V的原子分数为54.28%时，薄膜的硬度和弹性模量分别为14.1 GPa和147.6 GPa。掺杂V后，薄膜中生成了V₂O₅，降低了薄膜的耐磨性能。这主要是因为V促进了sp³杂化C数量的增加，并且在摩擦过程中，薄膜中的sp³杂化C的数量进一步增加，导致其硬度升高，耐磨性能下降。

Effect of V doping on properties of diamond-like carbon films

By means of magnetron sputtering, using the composite splicing target of graphite target and V target and argon as auxiliary gas, V doping diamond-like films with different atomic fractions were successfully prepared. Raman spectroscopy, electron probe, atomic force microscope, scanning electron microscope, nano-indentor, film stress tester, reciprocating friction and wear tester, and other equipment were used to study the effects of V doping on the microstructure, mechanical properties and tribological properties of diamond-like carbon films. The results show that V doping improves the mechanical properties of diamond-like films, when the atomic fraction of V in the film is 54.28%, the hardness and elastic modulus of the film are 14.1 GPa and 147.6 GPa, respectively. After V doping, V₂O₅ forms in the film, which reduces the wear resistance of the film. This is mainly because V promotes the increase of the numbers of sp³ hybrid C, and during the friction process, the numbers of sp³ hybrid C in the film further increases, resulting in the increase of hardness and the decrease of wear resistance.