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粒子成像测速法中曝光次数与干涉条纹位置的关系
引用本文:周革,张以谟.粒子成像测速法中曝光次数与干涉条纹位置的关系[J].天津大学学报(自然科学与工程技术版),1995,28(4):457-462.
作者姓名:周革  张以谟
摘    要:分析了PIV采样底片多次曝光时粒子衍射调制作用对干涉条纹位置的影响,推导出条纹偏移量与曝光次数和粒子相对位移量的关系,分析结果得到了实验的证明。

关 键 词:粒子成像测速法  位置  曝光  干涉条纹  流速测量

THE RELATIONSHIP BETWEEN THE EXPOSURE NUMBER AND THE INTERFERENTIAL FRINGE POSITION IN PARTICLE IMAGE VELOCIMETRY
Zhou Ge,Zhang Yimo,Li Heqiao.THE RELATIONSHIP BETWEEN THE EXPOSURE NUMBER AND THE INTERFERENTIAL FRINGE POSITION IN PARTICLE IMAGE VELOCIMETRY[J].Journal of Tianjin University(Science and Technology),1995,28(4):457-462.
Authors:Zhou Ge  Zhang Yimo  Li Heqiao
Institution:Dept.of Precision instruments Eng.
Abstract:When sampled photographs are examined I)y the interferential fringe in particle image velocimetry,the fringe position will shift due to the diffracting halo of the particle images.The shifted position of fringes for multi-exposure is analyzed.The functional relation between the fringe position and the exposure number and the particle displacement is deduced.The conclusion has been demonstrated by experiments.
Keywords:particle image velocimetry  fringe position  multi-exposure
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