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砷化铟中的剩余施主和高纯砷化铟晶体的生长Ⅰ.砷化铟的浅施主——总受主关系和剩余施主本性的推测
引用本文:邹元爔.砷化铟中的剩余施主和高纯砷化铟晶体的生长Ⅰ.砷化铟的浅施主——总受主关系和剩余施主本性的推测[J].应用科学学报,1983,1(2):107-110.
作者姓名:邹元爔
作者单位:中国科学院上海冶金研究所
摘    要:本文根据文献数据推导出InAs的浅施主ND对总受主NA的关系曲线,发现体单晶、气相和液相外延三种材料的数据能用一条曲线来表示.因此推测InAs体材料中的剩余施主应以化学杂质为主.

收稿时间:1982-04-14

GROWTH OF HIGH PURITY InAs CRYSTALS AND A DISCUSSION ON THE RESIDUAL DONORS I.Relationship Between the Concentrations of Shallow Donor and Total Acceptor and a Speculation About the Nature of Residual Donor in InAs
ZOU YUANXI.GROWTH OF HIGH PURITY InAs CRYSTALS AND A DISCUSSION ON THE RESIDUAL DONORS I.Relationship Between the Concentrations of Shallow Donor and Total Acceptor and a Speculation About the Nature of Residual Donor in InAs[J].Journal of Applied Sciences,1983,1(2):107-110.
Authors:ZOU YUANXI
Institution:Shanghai Institute of metallurgy, Aoademia Sinica
Abstract:A correlation between the calculated concentrations of shallow donor (ND) and total acceptor (NA) in InAs is deducod on the basis of the published data. It is shown that the data for bulk, VPE and LPE materials can be expressed by a single ND versus NA curve. This result leads to a reasonable inference that the total concentration of impurities Si, Cu, Na (K), S (Se, Te) and perhaps also G, could be responsible for the residual donor concentration in InAs.
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