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UV辐照强化NaClO溶液湿法脱硝的实验研究
引用本文:韩志涛,杨少龙,郑德康,于景奇,夏鹏飞,宋永惠,宋立国,严志军,潘新祥. UV辐照强化NaClO溶液湿法脱硝的实验研究[J]. 科学技术与工程, 2016, 16(28)
作者姓名:韩志涛  杨少龙  郑德康  于景奇  夏鹏飞  宋永惠  宋立国  严志军  潘新祥
作者单位:大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院,大连海事大学轮机工程学院
基金项目:交通运输部科技计划项目(NO.2015328225150);中央高校基本科研业务费专项资金资助(No.3132016018); 辽宁省教育厅科学研究一般项目资助(NO.L2014198)
摘    要:在实验室条件下,开展UV辐照强化NaClO溶液湿法脱硝实验研究,考察了UV辐照时间、NaClO溶液有效氯浓度与溶液初始pH值等因素对NO氧化率及强化率的影响。结果表明,随着UV辐照时间从5 min增加至17.5 min,NaClO溶液NO氧化率迅速升高,与无UV辐照条件相比,NO氧化效果得到显著增强。在相同UV辐照条件下,随着NaClO溶液有效氯浓度降低,NO氧化强化率不断提高。溶液初始pH值对NO氧化率及强化率影响较大。在实验研究基础上,对相关因素的影响机理以及UV/NaClO工艺强化NO氧化的可能反应途径进行了讨论。

关 键 词:次氯酸钠  一氧化氮  湿法喷淋  紫外  氧化
收稿时间:2016-06-16
修稿时间:2016-06-16

NO removal from simulated flue gas by UV-irradiated sodium hypochlorite solution
HAN Zhi-tao,YANG Shao-long,ZHENG De-kang,YU Jing-qi,XIA Peng-fei,SONG Yong-hui,SONG Li-guo,YAN Zhi-jun and PAN Xin-xiang. NO removal from simulated flue gas by UV-irradiated sodium hypochlorite solution[J]. Science Technology and Engineering, 2016, 16(28)
Authors:HAN Zhi-tao  YANG Shao-long  ZHENG De-kang  YU Jing-qi  XIA Peng-fei  SONG Yong-hui  SONG Li-guo  YAN Zhi-jun  PAN Xin-xiang
Affiliation:Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University,Marine Engineering College,Dalian Maritime University
Abstract:Nitric oxide (NO) removal from simulated flue gas by wet scrubbing using UV-irradiated sodium hypochlorite (UV/NaClO) was conducted in a lab-scale scrubbing reactor. Effects of UV irradiation time, free chlorine concentration and initial pH value of NaClO solution were investigated on NO oxidation efficiency. The results showed that when the UV irradiation time increased, the NO oxidation efficiency of UV/NaClO solution increased, which was significantly enhanced by UV irradiation. Under the same UV irradiation condition, the enhancing rate of NO oxidation efficiency increased with the decrease of free chlorine concentration of NaClO solution. The initial pH value of NaClO solution played an important role in removing NO. The reaction pathways of the NO removal by UV/NaClO solution were discussed preliminary.
Keywords:sodium hypochlorite   nitric oxide   wet scrubbing   ultraviolet light   oxidation
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