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基于单轴微拉伸的TSV铜力学性能研究
引用本文:李君翊,汪红,王溯,王慧颖,程萍,张振杰,丁桂甫. 基于单轴微拉伸的TSV铜力学性能研究[J]. 复旦学报(自然科学版), 2012, 51(2): 184-189,262,263
作者姓名:李君翊  汪红  王溯  王慧颖  程萍  张振杰  丁桂甫
作者单位:1. 微米/纳米加工技术国家重点实验室,上海200240/上海交通大学微纳科学技术研究院,上海200240
2. 上海新阳半导体材料股份有限公司,上海,201616
基金项目:科技部重大专项基金资助项目,国家自然科学基金资助项目
摘    要:电子产品的微型化趋势使芯片的三维集成概念应运而生,并通过硅通孔(TSV-through silicon via)技术得以实现.为了测试TSV中互连铜(Cu-TSV)的力学性能,提出了1个简便、易于操作的单轴微拉伸方法.利用有限元分析优化设计Cu-TSV微拉伸试样的支撑框架结构,有效减小试样在制作及操作过程中的损伤;种子层采用溅射Ti膜取代传统的溅射Cr/Cu膜,减小了电镀过程中的应力,避免了对种子层碱性刻蚀时对试样的腐蚀;采用单轴微拉伸系统对优化设计与制备的Cu-TSV微拉伸试样进行测试.经测试得到的Cu-TSV的杨氏模量与抗拉强度为25.4~32.9GPa和574~764MPa.

关 键 词:硅通孔  互连铜  微拉伸  微观力学性能

Investigation of Mechanical Properties of Cu-TSV by Uniaxial Micro-tensile Test
LI Jun-yi,WANG Hong,WANG Su,WANG Hui-ying,CHENG Ping,ZHANG Zhen-jie,DING Gui-fu. Investigation of Mechanical Properties of Cu-TSV by Uniaxial Micro-tensile Test[J]. Journal of Fudan University(Natural Science), 2012, 51(2): 184-189,262,263
Authors:LI Jun-yi  WANG Hong  WANG Su  WANG Hui-ying  CHENG Ping  ZHANG Zhen-jie  DING Gui-fu
Affiliation:1,2(1.National Key Laboratory of Science and Technology on Nano/Micro Fabrication,Shanghai 200240,China; 2.Shanghai Jiao Tong University,Research Institute of Micro/Nano Science and Technology,Shanghai 200240, China;3.Shanghai Sinyang Semiconductor Materials Co.,Ltd,Shanghai 201616,China)
Abstract:The miniaturization trend of microelectric products gives birth to 3D stacking of chips,which is realized by using TSV(through silicon via) technique.A novel micro-tensile specimen of the uniaxial micro-tensile test for measuring the mechanical properties of Cu-TSV is proposed.Finite-Element Method(FEM) has been used to optimize the design of the supporting frame of the sample with a Cu-TSV thin film,which can effectively reduce the damage ratio of the sample during operations.The surface-treated Ti seed layer has substituted for the traditional Cr/Cu seed layer to reduce the stress concentration and prevent the specimen from alkali corrosion when etching the seed layer.The samples have been tested by the uniaxial micro-tensile system to obtain the mechanical properties of the Cu-TSV thin film.The measured Young’s modulus and the ultimate tensile strength of Cu-TSV is 25.4—32.9 GPa and 574—764 MPa,respectively.
Keywords:TSV  Cu-TSV  micro-tensile test  micro-mechanical properties
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