Single-componentchemicallyamplifiedi-linemolecularglassphotoresistbased on calix[4]resorcinarenes

Calix4]resorcinarene, prepared by the acid- catalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix4]resorcinarene were partly pro- tected by tert-butoxycarbonyl （t-BOC） and then esterified with 2-diazo-l-naphthoquinone-4-sulfonyl chloride （2,1,4- DNQ-C1）. Upon irradiation to 365 nm light, the 2,1,4-DNQ groups undergo photolysis to generate a small quantity of sulfonic acid other than indene carboxylic acid. The gen- erated sulfonic acid can further catalyze the deprotection of the t-BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. The litho- graphic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper.

Single-component chemically amplified i-line molecular glass photoresist based on calix[4]resorcinarenes

Calix4]resorcinarene, prepared by the acid-catalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix4]resorcinarene were partly protected by tert-butoxycarbonyl (t-BOC) and then esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride (2,1,4-DNQ-Cl). Upon irradiation to 365 nm light, the 2,1,4-DNQ groups undergo photolysis to generate a small quantity of sulfonic acid other than indene carboxylic acid. The generated sulfonic acid can further catalyze the deprotection of the t-BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. The lithographic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper.