| A3钢基体磁控溅射离子镀铝膜的物相分析 |
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| 引用本文： | 王玉魁,薛春,朱英臣,余广华,陈宝清,王斐杰.A3钢基体磁控溅射离子镀铝膜的物相分析[J].大连理工大学学报,1986(2). |
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| 作者姓名： | 王玉魁 薛春 朱英臣 余广华 陈宝清 王斐杰 |
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| 作者单位： | 大连理工大学离子镀研究室
(王玉魁，薛春，朱英臣，余广华，陈宝清)，大连理工大学离子镀研究室(王斐杰) |
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| 摘 要： | 本文应用 Ｘ射线衍射分析和电子衍射分析研究了Ａ３钢基体磁控溅射离子镀铝 膜的相组成，结果表明，膜的相组成主要是基板负偏压所决定的。文中论述了正离子 对基板的溅射作用所引起的靶材原子和基板（基体）原子在基板上共同沉积的成膜机 理。
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| 关 键 词： | 离子镀 金属薄膜 相分析 阴极溅射 磁控管源/离子镀铝膜 |
The Identification of Phases on the Magnetron Sputtering Ion Plating Aluminum Films on the Matrix of A3 Steel |
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| Wang Yukui,Xue Chun,Zhu Yingchen,Yu Guanghua,Chen Baoqing,Wang Feijie.The Identification of Phases on the Magnetron Sputtering Ion Plating Aluminum Films on the Matrix of A3 Steel[J].Journal of Dalian University of Technology,1986(2). |
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| Authors: | Wang Yukui Xue Chun Zhu Yingchen Yu Guanghua Chen Baoqing Wang Feijie |
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| Institution: | Ion-Plating Research Section of DIT |
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| Abstract: | The phases of the magnetron sputtering ion plating aluminum films on the matrix of A3 steel have been examined by means of X-ray diffraction analysis and TEM. The results show that the phases of the films are mainly dependent on the negative bias of the substrate. In this paper, the mechanism of formation of the films is described. The sputtering of positive ions at the substrate brings about target element(Al) ions and substrate element(Fe) ions. The ions of the two elements are mixed and deposited on the substrate, forming the magnetron sputtering ion aluminum plating film on the A3 steel substrate. |
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| Keywords: | ion plating metal thin films phase analysis cathode sputtering magnetron source/ion plating aluminum films |
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