水溶性超支化光敏有机硅聚氨脂丙烯酸酯低聚物的合成

以三羟甲基丙烷(TMP)和N,N-二羟乙基-3-胺基丙酸甲酯为单体，通过“准一步法”合成三代超支化聚胺-酯(HBP-OH)，再与羟烷基硅油、异佛尔酮二异氰酸酯(IPDI)、二羟甲基丙酸(DMPA)和丙烯酸-β-羟乙酯(HEA)反应，合成了三代水溶性超支化光敏有机硅聚氨脂丙烯酸酯低聚物(WHBPSUA)。研究了反应温度、DMPA用量等因素对合成反应和产物性能的影响，确定了最佳反应条件，并通过IR、¹H-NMR和GPC对超支化聚胺-酯及低聚物结构进行了表征。结果表明，三代超支化聚胺-酯(HBP-OH)最佳反应温度分别为120、130和135 ℃；DMPA和羟烷基硅油物质的量的比为1∶1时，所合成产物WHBPSUA具有良好的水溶性和成像性。

Synthesis of water-soluble hyperbranched photosensitive polysiloxane urethane acrylate oligomers

Hyperbranched poly(amine-ester)s(HBP-OH) have been synthesized using trimethylolpropane(TMP) and N,N-diethylol-3-amine methylpropionate as raw materials through the pseudo-one-step route.Then water-soluble hyperbranched photosensitive polysiloxane oligomers(WHBPSUA) were synthesized using HBP-OH,hydroxyl-terminated polydimethylsiloxane,isophorone diisocyanate(IPDI),dimethylol propionic acid(DMPA) and 2-hydroxyethyl acrylate(HEA) as raw materials.The structures of HBP-OH and WHBPSUA were characterized by FT-IR,1H-NMR and gel permeation chromatography(GPC).The influences of the reaction temperature and concentration of DMPA on the synthesis reaction and the properties of the oligomers were studied in detail.The optimum reaction temperatures for the synthesis of the first,second and third generations of HBP-OH were 120,130 and 135 ℃,respectively.When the molar ratio of DMPA to polysiloxane was 1 to 1,the WHBPSUA oligomers had good water solubilities and imaging properties.