| 纳米4H-SiC薄膜的光学性质研究 |
| |
| 引用本文： | 张洪涛,徐重阳,赵伯芳,周雪梅. 纳米4H-SiC薄膜的光学性质研究[J]. 华中科技大学学报(自然科学版), 2001, 29(6): 52-53 |
| |
| 作者姓名： | 张洪涛 徐重阳 赵伯芳 周雪梅 |
| |
| 作者单位： | 华中科技大学电子科学与技术系 |
| |
| 基金项目： | 教育部高等学校博士学科点专项基金资助项目 (970 83470 ) |
| |
| 摘 要： | SiC薄膜具有结构不易控制，透明性较差的特点，采用PECVD方法淀积的纳米SiC薄膜经光学透过率测试表明，在637nm和795nm处高的光透过率，并且当薄膜的厚度增大时，仍然具有高透过率的特性，这一结果表明，PECVD技术具有制备结构均匀，透明的纳米SiC薄膜的优势，同时，在与非晶SiC薄膜进行对比中发现非晶SiC薄膜的透过率不如纳米SiC薄膜。
|
| 关 键 词： | 纳米结构 光学性质 碳化硅薄膜 光学透过率 PECVD方法 纤锌矿结构 |
| 文章编号： | 1000-8616(2001)06-0052-02 |
| 修稿时间： | 2000-10-31 |
Optical Properties of Nanocrystalline 4H-SiC Films |
| |
| Zhang Hongtao Xu Chongyang Zhao Bofang Zhou Xuemei Assoc. Prof., Dept. of Electronics Sci. ,Tech.,HUST,Wuhan ,China.. Optical Properties of Nanocrystalline 4H-SiC Films[J]. JOURNAL OF HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY.NATURE SCIENCE, 2001, 29(6): 52-53 |
| |
| Authors: | Zhang Hongtao Xu Chongyang Zhao Bofang Zhou Xuemei Assoc. Prof. Dept. of Electronics Sci. &Tech. HUST Wuhan China. |
| |
| Affiliation: | Zhang Hongtao Xu Chongyang Zhao Bofang Zhou Xuemei Assoc. Prof., Dept. of Electronics Sci. &Tech.,HUST,Wuhan 430074,China. |
| |
| Abstract: | The deposited nanocrystalline 4H SiC films using PECVD techniques have higher optical transmittance than amorphous SiC film at 637?nm and 795?nm. The optical transmittances of nanocrystalline 4H SiC films are still high with the increase of the film thickness. It indicates that the structures of nanocrystalline 4H SiC films grown on quartz substrates by using PECVD are homogeneous. The high transmittances of nanocrystalline 4H SiC films are ascribed to the stiochoimetry and small dimensional nanocrystalline. The higher carbon and/or silicon content will result in bad optical properties. |
| |
| Keywords: | silicon carbide film nano structure optical property |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
