| 磁控溅射法制备铝掺杂氧化锌薄膜研究进展 |
| |
| 作者单位： | ;1.商丘师范学院物理与电气信息学院;2.郑州大学物理工程学院 |
| |
| 摘 要： | 铝掺杂氧化锌(AZO)薄膜是一种n型半导体光学透明薄膜,具有优异的光电转换特性.综述了磁控溅射法制备AZO薄膜的研究现状.介绍了衬底温度、溅射功率、氧分压、溅射角度、衬底类型和退火温度等工艺参数对AZO薄膜的微结构、表面形貌和光电性能的影响.展望了其今后的研究方向和应用前景.
|
| 关 键 词： | AZO薄膜 磁控溅射法 光电性能 |
Research Progress of Al-Doped Zinc Oxide Thin Films by Magnetron Sputtering Method |
| |
| Affiliation: | ,School of Physics and Electrical Information,Shangqiu Normal University,School of Physical Engineering,Zhengzhou University |
| |
| Abstract: | Al-doped zinc oxide( AZO) film with excellent photoelectric performance is an n-type transparent conductive oxide film. The current research progress of AZO films prepared by magnetron sputtering method were reviewed with 26 references. The effects of sputtering parameters on the microstructure,surface morphology and photoelectric properties of AZO films were analyzed. The future prospects for the AZO films development were also discussed. |
| |
| Keywords: | AZO films magnetron sputtering method photoelectric properties |
| 本文献已被 CNKI 等数据库收录！ |
