| NiMn薄膜的无序有序转变 |
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| 引用本文： | 曾立荣,彭子龙,朱逢吾,赖武彦. NiMn薄膜的无序有序转变[J]. 北京科技大学学报, 2002, 24(1): 41-43. DOI: 10.3321/j.issn:1001-053X.2002.01.012 |
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| 作者姓名： | 曾立荣 彭子龙 朱逢吾 赖武彦 |
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| 作者单位： | 1. 北京科技大学材料科学与工程学院,北京,100083;2. 华中科技大学电子科学与技术系,武汉,430074;3. 中科院物理所,北京,100080 |
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| 基金项目： | 国家自然科学基金;19890310; |
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| 摘 要： | 研究了Si/Ta/NiMn/Al和Si/Ta/NiFe/NiMn/Al多层膜中NiMn薄膜经300 oC 5 h不同次数循环退火后的有序化情况.X射线衍射定量计算结果表明,高温循环退火能极大地促进NiMn薄膜的有序化.NiMn薄膜中有序相的含量随退火循环数的增加而持续增加.但含NiFe层的膜有序化过程要比无NiFe层时缓慢.显然,NiFe对NiMn的有序化有阻碍作用.
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| 关 键 词： | 薄膜 NiMn 有序化 循环退火 |
| 修稿时间： | 2001-02-28 |
Disorder-Order Transformation of NiMn Thin Films |
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| ZENG Lirong,PENG Zilong,ZHU Fengwu,LAI Wuyan. Disorder-Order Transformation of NiMn Thin Films[J]. Journal of University of Science and Technology Beijing, 2002, 24(1): 41-43. DOI: 10.3321/j.issn:1001-053X.2002.01.012 |
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| Authors: | ZENG Lirong PENG Zilong ZHU Fengwu LAI Wuyan |
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| Abstract: | The atomic disorder-Order transformation of NiMn thin films in the multilayers Si/Ta/NiMn/Al and Si/Ta/NiFe/NiMn/Al undergoing different number of annealing cycles at 300C for 5 hours was studied. Quantitative calculations of X-ray diffraction patterns show that annealing at a high temperature for several cycles can greatly facilitate the atomic ordering process of NiMn thin films. The relative amount of the ordered fct phase in NiMn thin films increases continuously with the increased number of annealing cycles. But for the multilayers containing a NiFe layer, the atomic ordering process of NiMn thin films is much slower compared with those without a NiFe layer. It is then evident that NiFe impedes the atomic ordering process of NiMn thin films. |
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| Keywords: | thin films NiMn atomic ordering |
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