| 磁控溅射Si/Co多层膜的小角X射线衍射测试研究 |
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| 引用本文： | 钱天才,饶之帆,杨喜昆.磁控溅射Si/Co多层膜的小角X射线衍射测试研究[J].云南民族大学学报(自然科学版),2001,10(2):326-328. |
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| 作者姓名： | 钱天才 饶之帆 杨喜昆 |
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| 作者单位： | 云南省分析测试研究所，昆明，650051 |
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| 摘 要： | 用小角X射线衍射方法对Si/Co多层膜进行了测试研究，应用衍射理论对测试中出现的周期数不多的强峰和其间的一系列次强峰进行了分析，在计算多层和单层膜厚度时，提出利用相邻两个衍射峰的角度之差来消除系统误差和定位误差的简便方法，使数据处理得到简化.最后，通过XPS分析指出，在膜层界面具有硅的化合物存在.
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| 关 键 词： | 小角X射线衍射 磁控溅射 Si/Co多层膜 |
| 文章编号： | 1005-7188(2001)02-0326-03 |
| 修稿时间： | 2000年8月27日 |
Small-angle X-Ray Diffraction Study on Si/Co Multilayer Thin Films |
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| QIAN Tian-cai,RAO Zhi-fan,YANG Xi-kun.Small-angle X-Ray Diffraction Study on Si/Co Multilayer Thin Films[J].Journal of Yunnan Nationalities University:Natural Sciences Edition,2001,10(2):326-328. |
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| Authors: | QIAN Tian-cai RAO Zhi-fan YANG Xi-kun |
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| Abstract: | small-angle x-ray diffraction study on Si/Co multilayer thin films has been undertaken . The big diffraction peaks of multilayer thin films with a less number of periods and a numbers of satellite peaks between the big peaks has been analyzed bydiffraction theory.
For calculating the thickness of multilayer and single layer films,a simple method with angles-difference of adjacent peaks was presented,which reduced system error and located deviation and made data process simple. Also, The chemical state in Si/Co interface was analyzed by XPS . The results showed that therewere silicide there. |
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| Keywords: | Small angle X-ray diffraction Magnetron sputtering Si/Co multilayer thin films |
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