| 用TiCl_3低温化学气相沉积TiN的实验研究 |
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| 引用本文： | 袁泽喜,胡传胜,谭萍.用TiCl_3低温化学气相沉积TiN的实验研究[J].武汉科技大学学报(自然科学版),1997(1). |
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| 作者姓名： | 袁泽喜 胡传胜 谭萍 |
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| 作者单位： | Yuan Zexi，Associate Professor;College of Material Science and Technology，Wuhan Yejin University of Science and Technology，Wuhan 430081，China. Hu Chuansheng Tan Ping |
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| 摘 要： | 运用热力学对用ＴｉＣｌ３为钛源在低温下化学气相沉积ＴｉＮ的可行性进行了论证，着重介绍了实验研究及实验结果。在所设计的ＴｉＣｌ３生成以及ＴｉＮ形成的实验装置上，通过对ＨＣｌ（ｇ）与ＮＨ３的流量和沉积总压强的调节与控制，在较低的温度（５５０℃）下，在钢基材料上获得了ＴｉＮ表面涂层。此研究旨在推动钢制工模具低温化学气相沉积ＴｉＮ涂层的应用
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| 关 键 词： | 低温化学气相沉积（LTCVD） TiCl_3 氧污染 |
The Primary Research of Low Temperature CVD TiN Coatings with Sub halide Titanium |
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| Yuan Zexi,Associate Professor,College of Material Science and Technology,Wuhan Yejin University of Science and Technology,Wuhan ,China. Hu Chuansheng Tan Ping.The Primary Research of Low Temperature CVD TiN Coatings with Sub halide Titanium[J].Journal of Wuhan University of Science and Technology(Natural Science Edition),1997(1). |
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| Authors: | Yuan Zexi Associate Professor College of Material Science and Technology Wuhan Yejin University of Science and Technology Wuhan China Hu Chuansheng Tan Ping |
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| Institution: | Yuan Zexi,Associate Professor,College of Material Science and Technology,Wuhan Yejin University of Science and Technology,Wuhan 430081,China. Hu Chuansheng Tan Ping |
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| Abstract: | |
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| Keywords: | LTCVD TiCl 3 oxygen contaminant |
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