| 电弧离子镀工艺参数对CrSiN薄膜性能影响的研究 |
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| 引用本文： | 曲燕青,聂朝胤,陈志谦.电弧离子镀工艺参数对CrSiN薄膜性能影响的研究[J].西南师范大学学报(自然科学版),2006,31(3):52-56. |
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| 作者姓名： | 曲燕青 聂朝胤 陈志谦 |
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| 作者单位： | 西南大学,材料科学与工程学院,重庆,400715 |
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| 基金项目： | 西南大学发展基金资助项目(SWNUF2005001) |
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| 摘 要： | 利用电弧离子镀方法,在(SCM415)钢基体上制备了Cr-Si-N薄膜.通过调节Cr-Si靶中Si的比例,沉积了Si含量不同的Cr-Si-N薄膜.讨论了Si含量、偏压对薄膜硬度的影响.添加Si后得到的纳米复合薄膜Cr-Si-N的硬度比单纯的CrN薄膜有了显著的提高.采用X射线衍射(XRD)和X射线光电子能谱(XPS)对Cr-Si-N薄膜进行分析,研究讨论了Cr-Si-N薄膜的成分、结构及薄膜硬度增强的微观机制.
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| 关 键 词： | 电弧离子镀 Cr-Si-N薄膜 显微硬度 内部压缩应力 |
| 文章编号： | 1000-5471（2006）03-0052-05 |
| 收稿时间： | 2005-10-11 |
| 修稿时间： | 2005年10月11 |
Microstructure, Composition and Hardness of Cr-Si-N Coatings Prepared by Arc Ion Plating Method |
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| QU Yan-qing,NIE Chao-yin,CHEN Zhi-qian.Microstructure, Composition and Hardness of Cr-Si-N Coatings Prepared by Arc Ion Plating Method[J].Journal of Southwest China Normal University(Natural Science),2006,31(3):52-56. |
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| Authors: | QU Yan-qing NIE Chao-yin CHEN Zhi-qian |
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| Institution: | School of Materials Science and Engineering, Southwest University, Chongqing 400715, China |
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| Abstract: | Cr-Si-N coatings by incorporating several atomic percentage of Si to CrN were prepared,using an arc ion plating method.In order to change the Si content in the coatings,CrSi targets of 5%,10%,15%Si were used.Carburized Chromium Molybdenum Steels(SCM415) were used as the substrates.The aim of this study is to investigate the influence of Si incorporation and bias voltage on the microstructure and hardness of the coatings.The hardness of the coatings increased drastically compare with CrN coating with very small quantity of Si incorporated.With X-ray diffraction(XRD) and X-ray photoelectron spectroscopy(XPS) the microstructure composition were studied. |
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| Keywords: | arc ion plating Cr-Si-N coating hardness compress stress |
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