首页 | 本学科首页   官方微博 | 高级检索  
     

基于80C196KC的大功率微弧氧化电源控制系统的研究
引用本文:陈克选,刘纪周,李春旭,李鹤岐,赵介勇. 基于80C196KC的大功率微弧氧化电源控制系统的研究[J]. 兰州理工大学学报, 2006, 32(3): 14-17
作者姓名:陈克选  刘纪周  李春旭  李鹤岐  赵介勇
作者单位:兰州理工大学,材料科学与工程学院,甘肃,兰州,730050
摘    要:针对镁合金表面处理对参数调节和效率的要求,研制了大功率微弧氧化电源控制系统,该系统以80C196KC为核心,对整个系统的动作程序和工艺参数进行控制,电源实现了双向不对称脉冲输出和在大电流、高电压工况下主要参数的一定范围调节.硬件电路与软件设计中采用有效的抗干扰措施,使整个控制系统稳定、可靠.实验结果表明,该系统可以满足微弧氧化工艺的要求,实现微弧氧化的自动化.

关 键 词:微弧氧化电源  80C196KC  双向不对称脉冲
文章编号:1673-5196(2006)03-0014-04
收稿时间:2005-09-16
修稿时间:2005-09-16

Investigation of control system of 80C196KC-based high-power supply for microarc oxidation
CHEN Ke-xuan,LIU Ji-zhou,LI Chun-xu,LI He-qi,ZHAO Jie-yong. Investigation of control system of 80C196KC-based high-power supply for microarc oxidation[J]. Journal of Lanzhou University of Technology, 2006, 32(3): 14-17
Authors:CHEN Ke-xuan  LIU Ji-zhou  LI Chun-xu  LI He-qi  ZHAO Jie-yong
Abstract:Aimed at the requirement of primary parameter adjusting and efficiency in the process of magnesium alloy surface treatment,a control system of high-power supply for microarc oxidation was developed.Monolithic computer 80C196KC was adopted as the kernel of this controlling system to control system operation and processing parameters during the microarc oxidation.With this high-power supply,two-way asymmetric pulse output,primary parameters could be continuously adjusted within a given range in the condition of high current and high voltage mode.Some effective anti-interference measures were applied in hardware circuit and software program designing,making the controlling system steady and reliable.The experimental result showed that the requirement of microarc oxidation processing could be met with this system.The automation of microarc oxidation was realized.
Keywords:power supply for microarc oxidation  80C196KC  two-way asymmetric pulse
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号