| 氧分压对射频磁控溅射制备氧化锌薄膜光电学性质的影响 |
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| 引用本文： | 彭福川,林丽梅,郑卫峰,盖荣权,赖发春. 氧分压对射频磁控溅射制备氧化锌薄膜光电学性质的影响[J]. 福建师范大学学报(自然科学版), 2011, 27(1): 52-56 |
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| 作者姓名： | 彭福川 林丽梅 郑卫峰 盖荣权 赖发春 |
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| 作者单位： | 福建师范大学物理与光电信息科技学院; |
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| 基金项目： | 福建省自然科学基金资助项目(2007J0317); 福建省教育厅资助项目(JA08048;JB08065) |
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| 摘 要： | 利用射频磁控溅射在石英基片上沉积ZnO薄膜.为了研究氧分压对ZnO薄膜的结构和光电学性质的影响,在氧分压0.00,2.54,5.06,7.57 mPa的条件下制备了4个样品.样品的微结构、表面形貌和光电学性质分别用X射线衍射仪、原子力显微镜、分光光度计和Van der Pauw方法进行测量.结果表明,所有样品的主要衍射...
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| 关 键 词： | 氧化锌薄膜 射频磁控溅射 氧分压 光电学性质 |
Effect of Oxygen Partical Pressure on the Optical and Electrical Properties of ZnO Films Deposited by RF Magnetron Sputtering |
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| PENG Fu-chuan,LIN Li-mei,ZHENG Wei-feng,GAI Rong-quan,LAI Fa-chun. Effect of Oxygen Partical Pressure on the Optical and Electrical Properties of ZnO Films Deposited by RF Magnetron Sputtering[J]. Journal of Fujian Teachers University(Natural Science), 2011, 27(1): 52-56 |
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| Authors: | PENG Fu-chuan LIN Li-mei ZHENG Wei-feng GAI Rong-quan LAI Fa-chun |
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| Affiliation: | PENG Fu-chuan,LIN Li-mei,ZHENG Wei-feng,GAI Rong-quan,LAI Fa-chun(School of Physics and OptoElectronics Technology,Fujian Normal University,Fuzhou 350108,China) |
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| Abstract: | ZnO films with different oxygen partial pressures(OPP) were deposited on quartz substrates by RF magnetron sputtering.The samples were prepared under four OPP of 0.00,2.54,5.06 and 7.57 mPa,respectively.The structure,morphology,optical and electrical properties were studied by X-ray diffraction,atomic force microscopy,spectrophotometer and Van der Pauw method,respectively.The experimental results show that the strongest X-ray diffraction peak in all samples is(002) peak.When OPP increases,the intensity of(0... |
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| Keywords: | ZnO film RF magnetron sputtering oxygen partial pressure optical and electrical properties |
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