| 射频溅射制备碳氮薄膜及其结构分析 |
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| 引用本文： | 彭军,崔敬忠,姚江宏,陈光华. 射频溅射制备碳氮薄膜及其结构分析[J]. 兰州大学学报(自然科学版), 1996, 0(2) |
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| 作者姓名： | 彭军 崔敬忠 姚江宏 陈光华 |
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| 作者单位： | 兰州大学物理系 |
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| 摘 要： | 报道了用射频等离子体溅射的方法在高阻单晶硅衬底上制备碳氮非晶薄膜，并利用拉曼光谱和红外吸收谱对其进行的结构分析研究．分析结果表明该膜中氮主要以ＣＮ，ＣＮ键形式与碳结合．在对薄膜进行退火处理后，薄膜的红外透过率增加，同时还观察到ＣＮ单键的红外吸收峰．说明高温退火对ＣＮ单键的形成有促进作用
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| 关 键 词： | 结构分析 退火 溅射 碳氮薄膜 |
Carbon Nitride Films Prepared by Reactive Sputtering and Their Structural Analysis |
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| Peng Jun Cui Jinzhong Yao Jianghong Chen Guanghua. Carbon Nitride Films Prepared by Reactive Sputtering and Their Structural Analysis[J]. Journal of Lanzhou University(Natural Science), 1996, 0(2) |
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| Authors: | Peng Jun Cui Jinzhong Yao Jianghong Chen Guanghua |
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| Abstract: | Carbon nitride amorphous films prepared by rf sputtering and their structral analysis are reported in this paper. IR, Raman properites of the film indicate that nitrogen is mainly incorporated in C N , C N bonds in the film. After annealing, the C N single bonds are detected in IR spectra. The promotion effect of annealing to form C N single bond in the film is discussed. |
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| Keywords: | structural analysis annealing sputtering carbon nitride films |
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