| 干湿法腐蚀工艺条件下CdTe薄膜光谱研究 |
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| 引用本文： | 宋慧瑾,鄢强.干湿法腐蚀工艺条件下CdTe薄膜光谱研究[J].成都大学学报(自然科学版),2012,31(3):267-269. |
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| 作者姓名： | 宋慧瑾 鄢强 |
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| 作者单位： | 1. 成都大学工业化制造学院,四川成都,610106
2. 成都金倍科技有限公司,四川成都,610041 |
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| 基金项目： | 国家自然科学基金（60976052）、四川省教育厅青年科研课题（10ZBl44）资助项目. |
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| 摘 要： | 采用等离子束溅射轰击刻蚀和溴甲醇腐蚀对CdTe薄膜表面进行后处理.对比研究了2种腐蚀条件下CdTe薄膜的光谱特性.结果表明:等离子束溅射轰击刻蚀可以彻底清除CdTe薄膜表面的氧化层,刻蚀后的CdTe薄膜颗粒更为均匀致密,等离子体刻蚀与溴甲醇腐蚀相比,可以改善CdTe薄膜表面的粗糙度,增强薄膜的附着力,改善薄膜的性能.
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| 关 键 词： | 等离子体 刻蚀 CdTe薄膜 太阳电池 |
Research on Spectrum of Conditions of Dry CdTe. Solar Cells Under and Wet Etching |
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| SONG Huijin,YAN Qiang.Research on Spectrum of Conditions of Dry CdTe. Solar Cells Under and Wet Etching[J].Journal of Chengdu University (Natural Science),2012,31(3):267-269. |
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| Authors: | SONG Huijin YAN Qiang |
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| Institution: | 1. School of Industrial and Manufacturing, Chengdu University, Chengdu 610106, China; 2. Chengdu Jinbei Science and Technology Co. Ltd., Chengtlu 610041, China) |
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| Abstract: | The surface of CdTe thin films was etched by plasma bombardment sputtering and corroded by methyl bromide. The two types of spectnam properties of CdTe thin films were compared under the two con- ditions. The results show that plasma bombardment sputtering can remove the surface oxide layer completely and make the partiches of the thin films more even and compact, which show that compared with methyl bromide corrosion, it can improve micro-roughness of the surface and improve the quality of the crystal par- ticles and the adhesion of the film. |
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| Keywords: | plasma etching CdTe thin film solar cells |
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