Co/Si多层膜的磁控溅射及其X射线衍射分析

用超高真空磁控溅射设备在不同溅射压强及衬底温度的工艺条件下制备了一系列Ｃｏ／Ｓｉ多层膜．Ｘ射线小角衍射证实所研制的多层膜具有周期调制结构．分别采用不同的理论方法计算了多层膜的周期和折射修正项．表明修正项不再仅对折射效应修正，而应理解为更广义的修正项．并应用广义修正总多层膜厚度Ｂｒａｇｇ公式确定出了主峰之间次峰的级数．

Prepared and X-Ray Diffraction Analysis of Co/Si Multilayers by High-Vacuum Magnetron Sputtering

A series of Co/Si multilayers were grown by high vacuum magnetron sputtering,at the different sputtering pressures and the different growth temperatures.The observation of small angle X ray diffraction demonstrated that the multilayers have periodic structure.Different methods have been adopt to calculate the layer thick of period and the index of modification.The results show that the values of modification not merely modify the effect of refraction and the values should be regarded as the effects of broaden modification.Also applied the modified Bragg formulation of the thickness of all layers to confirm the orders of the small lines among the main peaks.