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多层结构的X射线双晶衍射研究
引用本文:武蕴忠,滕琴.多层结构的X射线双晶衍射研究[J].应用科学学报,1995,13(3):347-351.
作者姓名:武蕴忠  滕琴
作者单位:中国科学院上海治金研究所,中国科学院上海硅酸盐研究所
基金项目:国家自然科学基金和中国科学院上海功能材料与器件研究中心资助项目
摘    要:用X射线双晶衍射术研究了玻璃薄层-铂膜-α-Al_2O_3多层结构。发现不同材料的玻璃层,使多层结构因热失配对铂膜产生不同的应力。对铂薄膜电阻器件的测量结果表明:应力引起器件的电阻值变化;不同的应力状态,产生不同方向的附加电阻。选择适当材料的玻璃层,使热失配在铂膜内产生相反的应力,从而造成相反的附加电阻。以这种应力补偿方法提高了薄膜铂电阻的可靠性。

关 键 词:X射线双晶衍射  多层结构  薄膜  玻璃  铂膜  陶瓷

STUDY OF MULTILAYER STRUCTURE USINGX-RAY DOUBLE CRYSTAL DIFFRACTION
WU YUNZHONG XUXUEMING WANG WEIYUAN.STUDY OF MULTILAYER STRUCTURE USINGX-RAY DOUBLE CRYSTAL DIFFRACTION[J].Journal of Applied Sciences,1995,13(3):347-351.
Authors:WU YUNZHONG XUXUEMING WANG WEIYUAN
Abstract:he multilayer strncture composed of a glass film, a platinumfilm and an a-Al_2O_3 substrate has been studied by using the technique ofX-ray double crystaldiffraetion and it is found that different glass materials result in different stressesin the Pt film caused by thermal mismatch within the multilayer materials. Themeasuring results of the thin film platinum resistor show that the stresses willinduce resistance change of the device and different stress status will produce addedresistance in different directions. Selecting proper glass materials can make oppo-site stress in Pt film and opposite anded resistance due to thermal mismatch. Thereliability of Pt resistor has been raised with the method of this stress compensa-tion.
Keywords:X-ray double crystal diffraction  thermal mismatch  Thermalstress  added resistance
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